Study on hybrid nanoimprint resists containing diazoketo group = 디아조케토그룹을 포함한 유무기 하이브리드 나노임프린트 레지스트에 관한 연구

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A Nanoimprint lithography (NIL) is the one of the promising nanolithographic techniques with low cost, simple process, and great precision. We propose the novel hybrid resists containing diazoketo group for high performance of the NIL process. Polyhedral oligomeric silsesquioxane (POSS), which induce high thermal stability and good mechanical property, is modified to diazoketo derivative as the photosensitive part. The obtained hybrid resists possess a variety of characteristics desirable for UV-NIL, such as high sensitivity ( 25 - 60 mJ/cm2 ), high young’s modulus ( 4.6 - 9.4 GPa ), low volumetric shrinkage ( 4.8 - 6.9 % ) , good release property, and high transparency to UV light. In addition, the photo polymerization can be performed under UV irradiation in normal atmosphere without any additives. Based on these characteristics, the optimized components are evaluated as UV-NIL test. Furthermore, The cured hybrid resists is adequate as a mold for the NIL-process. Transparent replica molds with 250 nm size features were reproducibly duplicated by using UV-NIL with commercial UV-curing resin.
Advisors
Kim, Jin-Baekresearcher김진백
Description
한국과학기술원 : 화학과,
Publisher
한국과학기술원
Issue Date
2013
Identifier
515237/325007  / 020113318
Language
eng
Description

학위논문(석사) - 한국과학기술원 : 화학과, 2013.2, [ viii, 38 p. ]

Keywords

nanoimprint lithography; UV-curing resist; POSS (Polyhedral oligomeric silsesquioxane); 나노임프린트 리소그래피; UV-경화 레지스트; 포스 (폴리헤드랄 올리고머릭 실세스퀴옥세인); 디아조 케조 그룹; diazoketo group

URI
http://hdl.handle.net/10203/180324
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=515237&flag=dissertation
Appears in Collection
CH-Theses_Master(석사논문)
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