Engineering of source/drain junctions in MOSFETs and its application to memory cellsMOSFET의 소스/드레인 전극의 엔지니어링 및 메모리 셀로의 응용

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 500
  • Download : 0
Advisors
Choi, Yang-Kyuresearcher최양규
Description
한국과학기술원 : 전기 및 전자공학과,
Publisher
한국과학기술원
Issue Date
2012
Identifier
486683/325007  / 020085339
Language
eng
Description

학위논문(박사) - 한국과학기술원 : 전기 및 전자공학과, 2012.2, [ vi, 135 p. ]

Keywords

engineering; Source and drain; MOSFET; Flash memory; NAND; junctionless; Schottky-barrier; dopant-segregation; FinFET; SONOS

URI
http://hdl.handle.net/10203/180193
Link
http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=486683&flag=dissertation
Appears in Collection
EE-Theses_Ph.D.(박사논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0