| 11601 | Plane strain compression of single crystalline Ni3Al-base intermetallic compounds Song, SH; Kishida, K; Demura, M; Oh, MH; Wee, Dang-Moon; Hirano, T, ICOTOM 14: TEXTURES OF MATERIALS, PTS 1AND 2 BOOK SERIES: MATERIALS SCIENCE FORUM, v.495-497, pp.772 - 12, 2005 |
| 11602 | Plane wave model법에 의한 거대자기변형 복합재료의 동적 자기기계 특성 해석 및 와전류의 영향 규명 = Dynamic magnetomechanical properties and effect of eddy currents on giant magnetostrictive composites obtained by plane wave modelling techniquelink 이세훈; Lee, Se-Hoon; et al, 한국과학기술원, 2005 |
| 11603 | Plant-transpiration Inspired Electrokinetic Power Generation Bae, Jaehyeong; Kim, Il-Doo, The 5th International Conference on Advanced Electromaterials, International Conference on Advanced Electromaterials, 2019-11-05 |
| 11604 | Plasma 소결조건이 알루미나 요업체의 소결거동과 미세구조에 미치는 효과 Kim, Chong Hee, 한국요업학회, 1990 |
| 11605 | Plasma Activated Evaporation 방법에 의해 증착된 Copper Phthalocyanine 박막의 NOx 농도측정에 관한 연구 이원종; 최창구; 장성수, 한국재료학회 추계학술연구발표회, pp.0 - 0, 1993-01-01 |
| 11606 | Plasma display panel and low temperature fabrication method thereof 배병수, 2011-01-11 |
| 11607 | Plasma Doping Strategy for Few-layer Transition Metal Dichalcogenides by Self-assembled Protective Nanostructures Yim, Soonmin; Jung, Yeon Sik, 제23회 한국 반도체 학술대회, 한국반도체학회, 2016-02-24 |
| 11608 | Plasma doping technology for fabrication of nanoscale metal-oxide-semiconductor devices Cho, Won-ju; Im, Kiju; Ahn, Chang-Geun; Yang, Jong-Heon; Oh, Jihun; Baek, In-Bok; Lee, Seongjae, Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.22, no.6, pp.3210 - 3213, 2004-11 |
| 11609 | Plasma Enhanced Atomic Layer Deposition of SrTiO3 Thin Films Using Sr(DPM)2 and TTIP KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.0 - 0, 2004-02-01 |
| 11610 | Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.107 - 109, 2004-02-01 |
| 11611 | Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma KANG SANG WON, Atomic Layer Deposition (ALD) 2004, pp.0 - 0, 2004-08-01 |
| 11612 | Plasma enhanced atomic layer deposition of transition metal nitrides (Invited talk) Kang, Sang-Won, Atomic Layer Deposition conference, ALD, 2001-05 |
| 11613 | Plasma enhanced chemically vapor deposited aluminum oxide films as a new etch mask material for microelectronic fabrication 이원종, KOREAN APPLIED PHYSICS, v.7, no.4, pp.289 - 296, 1994-04 |
| 11614 | Plasma Enhanced CVD 방법으로 제조한 $C_(1-x)$ $N_x$ nanotube에 Co, P를 doping한 촉매의 미세구조와 알칼리 $NaBH_4$ 용액에서의 수소발생특성에 관한 연구 = A study on the microstructures of catalysts doping Co, P components in $C_(1-x)$$N_x$ nanotubes prepared by PECVD and their hydrogen generation properties by hydrolysis of $NaBH_4$link 송철옥; Song, Cheol-Ock; et al, 한국과학기술원, 2008 |
| 11615 | Plasma enhanced CVD 방법으로 제조한 $C_{1-X}N_X$ nanotubes의 구조변화에 따른 수소저장특성에 관한 연구 = A study on the hydrogen storage porperty of $C_{1-X}N_X$ nanotubes prepared by PECVD with their nano-structural changelink 김현석; Kim, Hyun-Seok; 강정구; Kang, Jeung-Ku; et al, 한국과학기술원, 2006 |
| 11616 | Plasma Sintering of Al2O3-B4C Composite Kim, Do Kyung; Moon, YT; Kim, WJ; Kim, CH, JOURNAL OF MATERIALS SYNTHESIS AND PROCESSING, v.3, no.2, pp.115 - 120, 1995-04 |
| 11617 | Plasma Sprayed Deposition of Al-Ti-Cr Coating for Oxidation Protection of TiAl Alloys Wee, Dang-Moon, pp.0 - 0, 2002-01-01 |
| 11618 | Plasma 소결 조건이 알루미나 요업체의 소결거동과 미세구조에 미치는 효과 = Effect of plasma sintering conditions on sintering behavior and microstructure of alumina ceramicslink 문영태; Mun, Yung-Tae; et al, 한국과학기술원, 1990 |
| 11619 | Plasma- mediated fabrication of ultrathin NiAl nanosheets having rich oxygen vacancies and doped nitrogen sites and their utilization for high activity and robust stability in photoelectrochemical water oxidation Kim, Keon-Han; Choi, Jae Won; Lee, Heebin; Moon, Byeong Cheul; Park, Dong Gyu; Choi, Won Ho; Kang, Jeung Ku, JOURNAL OF MATERIALS CHEMISTRY A, v.6, no.46, pp.23283 - 23288, 2018-12 |
| 11620 | Plasma-Activacted Evaporation 방법에 의해 증착된 Copper Phthalocyanine 박막의 전기적 특성에 관한 연구 이원종, 한국재료학회 1993 추계학술연구발표회, pp.0 - 0, 1993-01-01 |
