| 3401 | Deposition and Characterization of Epitaxial Ferroelectric Thin films on Si No, Kwangsoo, Kor.-Jap. Joint Work. of the Deposition and Device Appl. ..., 1997-01-01 |
| 3402 | Deposition and characterization of epitaxial oxide layers on Si substrates Lee, Won-Jong; No, Kwangsoo; Song, HW; Lee, JS; Lee, HC; Hwang, DS; Jiang, ZT; et al, Proceedings of the 13th Korea-Japan seminar on new ceramics, 409, pp.409 - 413, 1997-01-01 |
| 3403 | Deposition and characterization of Ti-Al-N thin films deposited by plasma-assisted atomic layer deposition 강상원, 한국진공학회 제23회 학술발표회, 한국진공학회, 2002-06 |
| 3404 | Deposition Behavior of Pb(ZrxTi1-x)O3 Thin Films by Metaorganic Chemical Vapor Deposition J.H. Choi; Kim, Ho Gi, JOURNAL OF APPLIED PHYSICS, v.74, no.10, pp.6413 - 6417, 1993-11 |
| 3405 | Deposition Characteristics and Microstructure of the High Tc Superconducting YBa2Cu3O7-x Thin Films Prepared by MOCVD Kim, Sang Ho; Cho, Chang Hyun; No, Kwangsoo; Chun , Soung Soon, JOURNAL OF MARINE RESEARCH, v.6, no.4, pp.704 - 711, 1990-12 |
| 3406 | Deposition characteristics of low dielectric constant SiOF films prepared by ECR PECVD Byun, KM; Lee, Won-Jong, METALS AND MATERIALS-KOREA, v.6, no.2, pp.155 - 160, 2000-04 |
| 3407 | Deposition of fluorinated amorphous carbon thin films as a low-dielectric-constant material Han, Sang Soo; Kim, Hun Rae; Bae, Byeong-Soo, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.146, no.9, pp.3383 - 3388, 1999-09 |
| 3408 | Deposition of fluorinated amorphous carbon thin films with low dielectric constant and thermal stability Han, SS; Bae, Byeong-Soo, Materials, Technology and Reliability for Advanced Interconnetcs and Low-K Dielectrics, v.612, pp.561 - 567, 2000-04-23 |
| 3409 | Deposition of Low Dielectric a-C:F Thin Films Using ICP-CVD Bae, Byeong-Soo; Han, SS; Kim, TK, PacRim3, 1998 |
| 3410 | Deposition of NiAl coating for improvement of oxidation resistance of cold-rolled Ni3Al foils Kim, SH; Oh, MH; Kishida, K; Hirano, T; Wee, Dang-Moon, INTERMETALLICS, v.13, no.2, pp.129 - 136, 2005-02 |
| 3411 | Deposition of PZT films by MOCVD at low temperature and their change in properties with annealing temperature and Zr/Ti ratio Kim, YM; Lee, WJ; Kim, Ho Gi, THIN SOLID FILMS, v.279, no.1-2, pp.140 - 144, 1996-06 |
| 3412 | Deposition of Rhenium Thin Film via an Electro-Spraying Method Yong, Seok-Min; Kim, Do Kyung, 2013년 한국세라믹학회 춘계총회 및 연구발표회, 한국세라믹학회, 2013-04-18 |
| 3413 | Deposition of Rhenium Thin Film via an Electro-Spraying Method Yong, Seok-Min; 김도경, 2013년 한국재료학회 추계 학술발표대회 및 제 24회 신소재 심포지엄, 한국재료학회, 2013-11-08 |
| 3414 | Deposition of TiO2 and Antimony-doped Tin Oxide (ATO) Double Layer on a-Alumina Platelets for Conductive Pearlescent Pigment Marelign, Beyene Anteneh; Lee, Hyun Min; Kim, Do Kyung, Materials Science and Technology 16 (MS&T16), The American Ceramic Society (ACerS), 2016-10-25 |
| 3415 | Deposition of Titinium Dioxide Thin films by LPCVD 김호기, The Korean Ceramic Soc., Fall meeting, Korea Univ., 1990 |
| 3416 | Deriving Highly Active and Stable Iridium Based Oxygen Evolution Reaction Catalyst on Antimony Doped Tin Oxide 이규락; 정연식, 2019 한국세라믹학회 추계학술대회, 한국세라믹학회, 2019-11-13 |
| 3417 | Deriving highly-enhanced mass activity of electrochemical catalyst for oxygen evolution reaction with stack of ordered Iridium nanowire arrays = 정렬된 이리듐 나노와이어를 쌓아 올린 박막 촉매의 높은 활성 확인 및 원인 규명link Kim, Ye Ji; Jung, Yeon Sik; et al, 한국과학기술원, 2019 |
| 3418 | Design and analysis of error tolerant metasurface microwave absorber = 공정 오차에 둔감한 메타표면 응용 마이크로파 흡수체의 설계 및 분석link Park, Hyeon-Jin; Shin, Jonghwa; et al, 한국과학기술원, 2020 |
| 3419 | Design and analysis of the position detection algorithm for a probe storage Min, Dong-Ki; Hong, Seungbum, IEEE SENSORS JOURNAL, v.6, no.4, pp.1010 - 1015, 2006-08 |
| 3420 | Design and application of carbon nanomaterials for photoactive and charge transport layers in organic solar cells Jin, Sunghwan; Jun, Gwang Hoon; Jeon, Seokwoo; Hong, Soon Hyung, NANO CONVERGENCE, v.3, no.8, pp.1 - 10, 2016-12 |
