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Showing results 1 to 4 of 4

1
Formation of TiSi2 thin films from chemical vapor deposition using TiI4

Rhee, Hwa Sung; Jang, Tae Woong; Baek, Jong Tae; Ahn, Byung Tae, Proceedings of the 1998 MRS Spring Symposium, pp.345 - 350, MRS, 1998-04-13

2
In-situ growth and growth kinetics of epitaxial (100) CoSi2 layer on (100) Si by reactive chemical vapor deposition

Rhee, Hwa Sung; Lee, Heui Seung; Park, Jong Ho; Ahn, Byung Tae, Gate Stack and Silicide Issues in Silicon Processing, v.611, pp.0 - 0, 2000-04-25

3
Pre-treatment effect on aluminum thin films deposition from CVD using dimethylethylamine alane

Jang, Tae Woong; Rhee, Hwa Sung; Ahn, Byung Tae, Proceedings of the 1998 MRS Spring Symposium, pp.351 - 356, MRS, 1998-04-13

4
Silicon field emission arrays coated with CoSi2 layer grown by reactive chemical vapor deposition

Han, Byung Wook; Rhee, Hwa Sung; Ahn, Byung Tae; Lee, Nam Yang, Electron-Emissive Materials, Vacuum Microelectronics and Flat-Panel Displays, v.621, pp.R511 - R516, 2000-04-25

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