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Effects of Oxygen on the property of metallic Ru thin films deposited using Ru(C6H6)(C6H8) precursor No, Kwangsoo; Choi, Jong Wan; Hong, Jong In; Kim, Sung Kwan; Kim, Yun Seok; Kim, Yun Soo; Chung, Taek-Mo; et al, 4th Asian Meeting on Ferroelectrics, v.0, no.0, pp.0 - 0, 2003-12-13 |
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