Showing results 1 to 4 of 4
Hierarchical self-assembly of block copolymers for lithography-free nanopatterning Kim, Bong-Hoon; Shin, Dong-Ok; Jeong, Seong-Jun; Koo, Chong-Min; Jeon, Sang-Chul; Hwang, Wook-Jung; Lee, Su-Mi; et al, ADVANCED MATERIALS, v.20, no.12, pp.2303 - 2303, 2008-06 |
Large-area, highly oriented lamellar block copolymer nanopatterning directed by graphoepitaxially assembled cylinder nanopatterns Moon, Hyoung-Seok; Shin, Dong-Ok; Kim, Bong-Hoon; Jin, Hyeong-Min; Lee, Su-Mi; Lee, Moon-Gyu; Kim, Sang-Ouk, JOURNAL OF MATERIALS CHEMISTRY, v.22, no.13, pp.6307 - 6310, 2012-04 |
Spontaneous Lamellar Alignment in Thickness-Modulated Block Copolymer Films Kim, Bong-Hoon; Lee, Hyung-Min; Lee, Joo-Hyung; Son, Seung-Woo; Jeong, Seong-Jun; Lee, Su-Mi; Lee, Dong-Il; et al, ADVANCED FUNCTIONAL MATERIALS, v.19, no.16, pp.2584 - 2591, 2009-08 |
Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning Jeong, Seong-Jun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Ju-Young; Yu, Jae-Ho; Lee, Su-Mi; Lee, Moon-Gyu; et al, ACS NANO, v.4, no.9, pp.5181 - 5186, 2010-09 |
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