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Atomic layer deposition of silicon oxide thin films by alternating exposures to Si(2)Cl(6) and O(3) Lee, Seung-Won; Park, Kwangchol; Han, Byeol; Son, Sang-Ho; Rha, Sa-Kyun; Park, Chong-Ook; Lee, Won-Jun, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.11, no.7, pp.23 - 26, 2008 |
The electrical properties of dielectric stacks of SiO2 and Al2O3 prepared by atomic layer deposition method Han, Byeol; Lee, Seung-Won; Park, Kwangchol; Park, Chong-Ook; Rha, Sa-Kyun; Lee, Won-Jun, CURRENT APPLIED PHYSICS, v.12, no.2, pp.434 - 436, 2012-03 |
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