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Extreme-Pressure Imprint Lithography for Heat and Ultraviolet-Free Direct Patterning of Rigid Nanoscale Features Park, Woon Ik; Park, Tae Wan; Choi, Young Joong; Lee, Sangryun; Ryu, Seunghwa; Liang, Xiaogan; Jung, Yeon Sik, ACS NANO, v.15, no.6, pp.10464 - 10471, 2021-06 |
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