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Growth of TiO2 thin films on Si(100) and Si(111) substrates using single molecular precursor by high-vacuum MOCVD and comparison of growth behavior and structural properties Jung, CK; Kang, BC; Chae, HY; Kim, YS; Seo, MK; Kim, SK; Lee, SB; et al, JOURNAL OF CRYSTAL GROWTH, v.235, no.1-4, pp.450 - 456, 2002-02 |
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