| 11781 | Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma KANG SANG WON, 5th International AVS Conference on Microelectronics and Interfaces, pp.107 - 109, 2004-02-01 |
| 11782 | Plasma Enhanced Atomic Layer Deposition of Ta-N films using TaF5 with N2/H2/Ar mixed gas plasma KANG SANG WON, Atomic Layer Deposition (ALD) 2004, pp.0 - 0, 2004-08-01 |
| 11783 | Plasma enhanced atomic layer deposition of transition metal nitrides (Invited talk) Kang, Sang-Won, Atomic Layer Deposition conference, ALD, 2001-05 |
| 11784 | Plasma enhanced chemically vapor deposited aluminum oxide films as a new etch mask material for microelectronic fabrication 이원종, KOREAN APPLIED PHYSICS, v.7, no.4, pp.289 - 296, 1994-04 |
| 11785 | Plasma Enhanced CVD 방법으로 제조한 $C_(1-x)$ $N_x$ nanotube에 Co, P를 doping한 촉매의 미세구조와 알칼리 $NaBH_4$ 용액에서의 수소발생특성에 관한 연구 = A study on the microstructures of catalysts doping Co, P components in $C_(1-x)$$N_x$ nanotubes prepared by PECVD and their hydrogen generation properties by hydrolysis of $NaBH_4$link 송철옥; Song, Cheol-Ock; et al, 한국과학기술원, 2008 |
| 11786 | Plasma enhanced CVD 방법으로 제조한 $C_{1-X}N_X$ nanotubes의 구조변화에 따른 수소저장특성에 관한 연구 = A study on the hydrogen storage porperty of $C_{1-X}N_X$ nanotubes prepared by PECVD with their nano-structural changelink 김현석; Kim, Hyun-Seok; 강정구; Kang, Jeung-Ku; et al, 한국과학기술원, 2006 |
| 11787 | Plasma Sintering of Al2O3-B4C Composite Kim, Do Kyung; Moon, YT; Kim, WJ; Kim, CH, JOURNAL OF MATERIALS SYNTHESIS AND PROCESSING, v.3, no.2, pp.115 - 120, 1995-04 |
| 11788 | Plasma Sprayed Deposition of Al-Ti-Cr Coating for Oxidation Protection of TiAl Alloys Wee, Dang-Moon, pp.0 - 0, 2002-01-01 |
| 11789 | Plasma 소결 조건이 알루미나 요업체의 소결거동과 미세구조에 미치는 효과 = Effect of plasma sintering conditions on sintering behavior and microstructure of alumina ceramicslink 문영태; Mun, Yung-Tae; et al, 한국과학기술원, 1990 |
| 11790 | Plasma- mediated fabrication of ultrathin NiAl nanosheets having rich oxygen vacancies and doped nitrogen sites and their utilization for high activity and robust stability in photoelectrochemical water oxidation Kim, Keon-Han; Choi, Jae Won; Lee, Heebin; Moon, Byeong Cheul; Park, Dong Gyu; Choi, Won Ho; Kang, Jeung Ku, JOURNAL OF MATERIALS CHEMISTRY A, v.6, no.46, pp.23283 - 23288, 2018-12 |
| 11791 | Plasma-Activacted Evaporation 방법에 의해 증착된 Copper Phthalocyanine 박막의 전기적 특성에 관한 연구 이원종, 한국재료학회 1993 추계학술연구발표회, pp.0 - 0, 1993-01-01 |
| 11792 | Plasma-activated evaporation 방법에 의해 증착된 copper phthalocyanine 박막의 구조분석 = Structural analysis of copper phthalocyanine thin films prepared by plasma-activated evaporationlink 김준태; Kim, Jun-Tae; et al, 한국과학기술원, 1992 |
| 11793 | Plasma-Assisted CMP for Planarization of Adhesive Polymers in 3D Stacked Semiconductor Devices Kang, Sukkyung; Park, Juseong; Jeon, Chan Su; Kim, Kyung Min; Kim, Sanha, International Conference on Planarization/CMP Technology, ICPT 2023, International Conference on Planarization Technology (ICPT), 2023-11-01 |
| 11794 | Plasma-assisted formation of metallic nickel domains on nickel-iron-molybdenum oxyhydroxide for efficient, electrocatalytic oxygen-evolution reaction Moon, Byeong Cheul; Kang, Jeung Ku, 2019 ACS National Meeting & Exposition, American Chemical Society, 2019-04-02 |
| 11795 | Plasma-assisted molecular beam epitaxy of In xGa 1-XN films on: C-plane sapphire substrates Shin, EunJung; Seok, LimDong; Lim, SeHwan; Han, SeokKyu; Lee, HyoSung; Hong, SoonKu; Joeng, Myoungho; et al, Korean Journal of Materials Research, v.22, no.4, pp.185 - 189, 2012-04 |
| 11796 | Plasma-assisted molecular-beam epitaxy of ZnO films on (0001) Al2O3: Effects of the MgO buffer layer thickness Kim, Jae Goo; Han, Seok Kyu; Kang, Dong-Suk; Yang, Sang Mo; Hong, Soon-Ku; Lee, Jae Wook; Lee, Jeong Yong; et al, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.53, no.1, pp.271 - 275, 2008-07 |
| 11797 | Plasma-enhanced ALD of titanium-silicon-nitride using TiCl4, SiH4, and N-2/H-2/Ar plasma Park, JS; Kang, SW, ELECTROCHEMICAL AND SOLID STATE LETTERS, v.7, no.8, pp.C87 - C89, 2004 |
| 11798 | Plasma-Enhanced ALD of Titanium-Silicon-Nitride Using TiCl4, SiH4, and N2/H2/Ar Plasma KANG SANG WON, Atomic Layer Deposition (ALD) 2002, 2002-01-01 |
| 11799 | Plasma-Enhanced Atomic Layer Deposition of Aluminum Grown by a Sequential Supply of TMA and H2 Kang, Sang-Won, 3rd International AVS Conference on Microelectronics and Interfaces, ICMI, 2002-02 |
| 11800 | Plasma-enhanced atomic layer deposition of Ru-TiN thin films for copper diffusion barrier metals Kwon, SH; Kwon, OK; Min, JS; Kang, SW, JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.153, no.6, pp.G578 - G581, 2006 |
