Solution-based adaptive parallel patterning by laser-induced local plasmonic surface defunctionalization

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Adaptive mass fabrication method based on laser-induced plasmonic local surface defunctionalization was suggested to realize solution-based high resolution self-patterning on transparent substrate in parallel. After non-patterned functional monolayer was locally deactivated by laser-induced metallic plasma species, various micro/nano metal structures could be simultaneously fabricated by the parallel self-selective deposition of metal nanoparticles on a specific region. This method makes the eco-friendly and cost-effective production of high resolution pattern possible. Moreover, it can respond to design change actively due to the broad controllable range and easy change of key patterning specifications such as a resolution (subwavelength similar to 100 mu m), thickness (100 nm similar to 6 mu m), type (dot and line), and shape. (C) 2012 Optical Society of America
Publisher
OPTICAL SOC AMER
Issue Date
2012-12
Language
English
Article Type
Article
Keywords

SELF-ASSEMBLED MONOLAYERS; FEMTOSECOND LASER; FABRICATION; NANOPARTICLE; INK; LITHOGRAPHY; NANOMETER; ELECTRODE; OXIDE; AIR

Citation

OPTICS EXPRESS, v.20, no.27, pp.29111 - 29120

ISSN
1094-4087
URI
http://hdl.handle.net/10203/174188
Appears in Collection
ME-Journal Papers(저널논문)
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