The fabrication of 3-dimensional complex patterns with 10nm scale by secondary sputtering phenomenon

Abstract

Here, we demonstrate a novel patterning technology enabling to fabricate the high resolution of complex nanoscale patterns with simple process. The idea arises from the angular distribution of target particles by ion-beam bombardment, which use the ultra-thin nano structure in consistent with side shape of polymer patterns by attaching target materials to the polymer surfaces during accelerated ion-assisted bombardment. Also we have developed an highly advanced nanopatterning technique by adopting secondary sputtering lithography repetitively in order to achieve the very complex 3-dimeansional patterns and connected 10nm scale patterns. We were able to fabricated the grid pattern with high resolution(10nm scale) and high aspect ratio(-20) and connected ring structures like five ringed Olympic flag over large area( 7mm x 7mm).