Microfluidic Photomasks for Controlled Line Patterns
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Jae-Hoon | - |
| dc.contributor.author | Lee, Seung-Kon | - |
| dc.contributor.author | Kim, Shin-Hyun | - |
| dc.contributor.author | Park, Sung-Gyu | - |
| dc.contributor.author | Yang, Seung-Man | - |
| dc.date.accessioned | 2013-03-28T07:28:13Z | - |
| dc.date.available | 2013-03-28T07:28:13Z | - |
| dc.date.created | 2013-02-12 | - |
| dc.date.issued | 2008-12 | - |
| dc.identifier.citation | The 21st International Symposium on Chemical Engineering Kyushu(Japan)-Daejeon/Chungnam(Korea), v., no., pp. - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/163848 | - |
| dc.language | ENG | - |
| dc.publisher | Kyushu Branch, The Society of Chemical Engineers, Japan, Daejeon/Chungnam Branch, Korean Institute of Chemical Engineers, Korea | - |
| dc.title | Microfluidic Photomasks for Controlled Line Patterns | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 21st International Symposium on Chemical Engineering Kyushu(Japan)-Daejeon/Chungnam(Korea) | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Kim, Shin-Hyun | - |
| dc.contributor.nonIdAuthor | Choi, Jae-Hoon | - |
| dc.contributor.nonIdAuthor | Lee, Seung-Kon | - |
| dc.contributor.nonIdAuthor | Park, Sung-Gyu | - |
| dc.contributor.nonIdAuthor | Yang, Seung-Man | - |
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