Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimizationMultiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Cho, Byung Jin | - |
| dc.contributor.author | Poon, D | - |
| dc.contributor.author | Tan, LS | - |
| dc.contributor.author | Bhat, M | - |
| dc.contributor.author | See, A | - |
| dc.date.accessioned | 2013-03-18T09:13:26Z | - |
| dc.date.available | 2013-03-18T09:13:26Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2004-03-15 | - |
| dc.identifier.citation | IEEE 4th International Workshop on Junction Technology (IWJT-2004), v., no., pp.22 - 26 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/146880 | - |
| dc.language | ENG | - |
| dc.title | Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization | - |
| dc.title.alternative | Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 22 | - |
| dc.citation.endingpage | 26 | - |
| dc.citation.publicationname | IEEE 4th International Workshop on Junction Technology (IWJT-2004) | - |
| dc.identifier.conferencecountry | China | - |
| dc.identifier.conferencecountry | China | - |
| dc.contributor.localauthor | Cho, Byung Jin | - |
| dc.contributor.nonIdAuthor | Poon, D | - |
| dc.contributor.nonIdAuthor | Tan, LS | - |
| dc.contributor.nonIdAuthor | Bhat, M | - |
| dc.contributor.nonIdAuthor | See, A | - |
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