DC Field | Value | Language |
---|---|---|
dc.contributor.author | Cho, Byung Jin | - |
dc.contributor.author | Mathew, S | - |
dc.contributor.author | Bera, LK | - |
dc.contributor.author | Balasubramanian, N | - |
dc.contributor.author | Joo, MS | - |
dc.date.accessioned | 2013-03-18T05:21:53Z | - |
dc.date.available | 2013-03-18T05:21:53Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2003-12-11 | - |
dc.identifier.citation | 2nd International Conference on Materials for Advanced Technologies, v., no., pp.516 - 516 | - |
dc.identifier.uri | http://hdl.handle.net/10203/145111 | - |
dc.language | ENG | - |
dc.title | Channel mobility behaviour in high-K/metal gate NMOSFETs | - |
dc.title.alternative | Channel mobility behaviour in high-K/metal gate NMOSFETs | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 516 | - |
dc.citation.endingpage | 516 | - |
dc.citation.publicationname | 2nd International Conference on Materials for Advanced Technologies | - |
dc.identifier.conferencecountry | Singapore | - |
dc.identifier.conferencecountry | Singapore | - |
dc.contributor.localauthor | Cho, Byung Jin | - |
dc.contributor.nonIdAuthor | Mathew, S | - |
dc.contributor.nonIdAuthor | Bera, LK | - |
dc.contributor.nonIdAuthor | Balasubramanian, N | - |
dc.contributor.nonIdAuthor | Joo, MS | - |
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