DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, JH | - |
dc.contributor.author | Han, CH | - |
dc.contributor.author | Kim, UJ | - |
dc.contributor.author | Park, Chong-Ook | - |
dc.contributor.author | Rha, SK | - |
dc.contributor.author | Lee, WJ | - |
dc.date.accessioned | 2013-03-18T02:42:21Z | - |
dc.date.available | 2013-03-18T02:42:21Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2004-04-13 | - |
dc.identifier.citation | Amorphous and Nanocrystalline Silicon Science and Technology - 2004, v.808, no., pp.413 - 417 | - |
dc.identifier.issn | 0272-9172 | - |
dc.identifier.uri | http://hdl.handle.net/10203/144071 | - |
dc.language | ENG | - |
dc.title | An investigation of silicon oxide thin film by atomic layer deposition | - |
dc.type | Conference | - |
dc.identifier.scopusid | 2-s2.0-12744277383 | - |
dc.type.rims | CONF | - |
dc.citation.volume | 808 | - |
dc.citation.beginningpage | 413 | - |
dc.citation.endingpage | 417 | - |
dc.citation.publicationname | Amorphous and Nanocrystalline Silicon Science and Technology - 2004 | - |
dc.identifier.conferencecountry | United States | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Park, Chong-Ook | - |
dc.contributor.nonIdAuthor | Lee, JH | - |
dc.contributor.nonIdAuthor | Han, CH | - |
dc.contributor.nonIdAuthor | Kim, UJ | - |
dc.contributor.nonIdAuthor | Rha, SK | - |
dc.contributor.nonIdAuthor | Lee, WJ | - |
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