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College of Engineering(공과대학)School of Electrical Engineering(전기및전자공학부)EE-Conference Papers(학술회의논문)

Integration of high-K gate dielectric into high mobility substrateIntegration of high-K gate dielectric into high mobility substrate

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dc.contributor.authorCho, Byung Jin-
dc.contributor.authorLoh, WP-
dc.contributor.authorZang, H-
dc.contributor.authorDalapati, GK-
dc.contributor.authorTong, Y-
dc.contributor.authorChoi, KJ-
dc.date.accessioned2013-03-18T00:10:22Z-
dc.date.available2013-03-18T00:10:22Z-
dc.date.created2012-02-06-
dc.date.issued2006-11-10-
dc.identifier.citation2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES SCIENCE AND TECHNOLOGY, v., no., pp.8 - 10-
dc.identifier.urihttp://hdl.handle.net/10203/143072-
dc.languageENG-
dc.titleIntegration of high-K gate dielectric into high mobility substrate-
dc.title.alternativeIntegration of high-K gate dielectric into high mobility substrate-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage8-
dc.citation.endingpage10-
dc.citation.publicationname2006 International Workshop on DIELECTRIC THIN FILMS FOR FUTURE ULSI DEVICES SCIENCE AND TECHNOLOGY-
dc.identifier.conferencecountryJapan-
dc.identifier.conferencecountryJapan-
dc.contributor.localauthorCho, Byung Jin-
dc.contributor.nonIdAuthorLoh, WP-
dc.contributor.nonIdAuthorZang, H-
dc.contributor.nonIdAuthorDalapati, GK-
dc.contributor.nonIdAuthorTong, Y-
dc.contributor.nonIdAuthorChoi, KJ-
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EE-Conference Papers(학술회의논문)
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