Ta2O5-SiO2 Nano- Laminated Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition

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Issue Date
2004-08-01
Language
ENG
Citation

Atomic layer deposition (ALD) 2004, pp.0 - 0

URI
http://hdl.handle.net/10203/141909
Appears in Collection
MS-Conference Papers(학술회의논문)
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