Ta2O5-SiO2 Nano- Laminated Thin Films Grown by Plasma-Enhanced Atomic Layer Deposition
- Issue Date
- 2004-08-01
- Language
- ENG
- Citation
Atomic layer deposition (ALD) 2004, pp.0 - 0
- Appears in Collection
- MS-Conference Papers(학술회의논문)
- Files in This Item
- There are no files associated with this item.
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