Via filling for system in packaging by using ionized metal plasma PVD and electroplating

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 358
  • Download : 0
Issue Date
2004
Language
ENG
Citation

Kyoto Joint Symposium on Materials Science and Engineering for the 21st Century, pp.88 - 88

URI
http://hdl.handle.net/10203/140169
Appears in Collection
MS-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0