Energy gap and band alignment of (HfO2)x(Al2O3)1-x on (100) Si by XPS
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Cho, Byung Jin | - |
| dc.contributor.author | Yu, HY | - |
| dc.contributor.author | Li, MF | - |
| dc.contributor.author | Kwong, DL | - |
| dc.contributor.author | Pan, JS | - |
| dc.contributor.author | Ang, CH | - |
| dc.contributor.author | Zheng, JZ | - |
| dc.date.accessioned | 2013-03-16T20:02:30Z | - |
| dc.date.available | 2013-03-16T20:02:30Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2002-12-17 | - |
| dc.identifier.citation | 2002 International Conf. on Solid State Devices and Materials (SSDM), v., no., pp.0 - 0 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/135272 | - |
| dc.language | ENG | - |
| dc.title | Energy gap and band alignment of (HfO2)x(Al2O3)1-x on (100) Si by XPS | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 0 | - |
| dc.citation.endingpage | 0 | - |
| dc.citation.publicationname | 2002 International Conf. on Solid State Devices and Materials (SSDM) | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.identifier.conferencecountry | Japan | - |
| dc.contributor.localauthor | Cho, Byung Jin | - |
| dc.contributor.nonIdAuthor | Yu, HY | - |
| dc.contributor.nonIdAuthor | Li, MF | - |
| dc.contributor.nonIdAuthor | Kwong, DL | - |
| dc.contributor.nonIdAuthor | Pan, JS | - |
| dc.contributor.nonIdAuthor | Ang, CH | - |
| dc.contributor.nonIdAuthor | Zheng, JZ | - |
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