R.F. Magnetron Reactive Sputtering법으로 증착한 ITO박막의 밀도가 전기적성질에 미치는 영향Effect of Film Density on the Electrical Properties of ITO Thin Films Deposited by R.F. Magnetron Reactive Sputtering
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 최시경 | - |
| dc.contributor.author | 유동주 | - |
| dc.date.accessioned | 2013-03-16T18:31:55Z | - |
| dc.date.available | 2013-03-16T18:31:55Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 2000 | - |
| dc.identifier.citation | 한국요업학회, v., no., pp.191 - | - |
| dc.identifier.uri | http://hdl.handle.net/10203/134366 | - |
| dc.language | KOR | - |
| dc.title | R.F. Magnetron Reactive Sputtering법으로 증착한 ITO박막의 밀도가 전기적성질에 미치는 영향Effect of Film Density on the Electrical Properties of ITO Thin Films Deposited by R.F. Magnetron Reactive Sputtering | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 191 | - |
| dc.citation.publicationname | 한국요업학회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 최시경 | - |
| dc.contributor.nonIdAuthor | 유동주 | - |
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