R.F. Magnetron Reactive Sputtering법으로 증착한 ITO박막의 밀도가 전기적성질에 미치는 영향Effect of Film Density on the Electrical Properties of ITO Thin Films Deposited by R.F. Magnetron Reactive Sputtering

Cited 0 time in webofscience Cited 0 time in scopus
  • Hit : 453
  • Download : 0
Issue Date
2000
Language
KOR
Citation

한국요업학회, pp.191 -

URI
http://hdl.handle.net/10203/134366
Appears in Collection
MS-Conference Papers(학술회의논문)
Files in This Item
There are no files associated with this item.

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0