Molecular Dynamics Simulation of Plasma Etching of Silicon Nitride

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dc.contributor.authorKim, DoHyun-
dc.date.accessioned2013-03-16T18:00:19Z-
dc.date.available2013-03-16T18:00:19Z-
dc.date.created2012-02-06-
dc.date.issued2000-10-
dc.identifier.citation, v., no., pp.59 - 60-
dc.identifier.urihttp://hdl.handle.net/10203/134048-
dc.languageENG-
dc.titleMolecular Dynamics Simulation of Plasma Etching of Silicon Nitride-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage59-
dc.citation.endingpage60-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthorKim, DoHyun-
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CBE-Conference Papers(학술회의논문)
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