DC Field | Value | Language |
---|---|---|
dc.contributor.author | Choi, Yang-Kyu | - |
dc.contributor.author | King, Tsu-Jae | - |
dc.contributor.author | Ranade, Pushkar | - |
dc.contributor.author | Chang, Leland | - |
dc.date.accessioned | 2013-03-16T10:45:30Z | - |
dc.date.available | 2013-03-16T10:45:30Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2002-12 | - |
dc.identifier.citation | the International Electron Devices and Materials Symposia, v., no., pp.11 - 15 | - |
dc.identifier.uri | http://hdl.handle.net/10203/130494 | - |
dc.language | ENG | - |
dc.title | Advanced Materials and Processes for Nanometer-scale FinFETs | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 11 | - |
dc.citation.endingpage | 15 | - |
dc.citation.publicationname | the International Electron Devices and Materials Symposia | - |
dc.identifier.conferencecountry | Taiwan, Province of China | - |
dc.identifier.conferencecountry | Taiwan, Province of China | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | King, Tsu-Jae | - |
dc.contributor.nonIdAuthor | Ranade, Pushkar | - |
dc.contributor.nonIdAuthor | Chang, Leland | - |
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