Titanium Dioxide Films Grown by Plasma-Enhanced Atomic Layer Deposition

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dc.contributor.authorKANG SANG WON-
dc.date.accessioned2013-03-16T07:26:34Z-
dc.date.available2013-03-16T07:26:34Z-
dc.date.created2012-02-06-
dc.date.issued2002-01-01-
dc.identifier.citation3rd International AVS Conference on Microelectronics and Interfaces, v., no., pp. --
dc.identifier.urihttp://hdl.handle.net/10203/128856-
dc.languageENG-
dc.titleTitanium Dioxide Films Grown by Plasma-Enhanced Atomic Layer Deposition-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname3rd International AVS Conference on Microelectronics and Interfaces-
dc.identifier.conferencecountryUnited States-
dc.identifier.conferencecountryUnited States-
dc.contributor.localauthorKANG SANG WON-
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MS-Conference Papers(학술회의논문)
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