Oxidation of polysilicon using ECR N2O plasma oxidation and its application for poly-Si TFTs

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dc.contributor.author한철희-
dc.date.accessioned2013-03-15T14:30:18Z-
dc.date.available2013-03-15T14:30:18Z-
dc.date.created2012-02-06-
dc.date.issued1996-
dc.identifier.citation제3회 반도체 학술대회, v., no., pp.195 - 198-
dc.identifier.urihttp://hdl.handle.net/10203/120285-
dc.languageKOR-
dc.titleOxidation of polysilicon using ECR N2O plasma oxidation and its application for poly-Si TFTs-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.beginningpage195-
dc.citation.endingpage198-
dc.citation.publicationname제3회 반도체 학술대회-
dc.identifier.conferencecountrySouth Korea-
dc.identifier.conferencecountrySouth Korea-
dc.contributor.localauthor한철희-
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