Oxidation of polysilicon using ECR N2O plasma oxidation and its application for poly-Si TFTs
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 한철희 | - |
| dc.date.accessioned | 2013-03-15T14:30:18Z | - |
| dc.date.available | 2013-03-15T14:30:18Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1996 | - |
| dc.identifier.citation | 제3회 반도체 학술대회, v., no., pp.195 - 198 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/120285 | - |
| dc.language | KOR | - |
| dc.title | Oxidation of polysilicon using ECR N2O plasma oxidation and its application for poly-Si TFTs | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 195 | - |
| dc.citation.endingpage | 198 | - |
| dc.citation.publicationname | 제3회 반도체 학술대회 | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.identifier.conferencecountry | South Korea | - |
| dc.contributor.localauthor | 한철희 | - |
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