A Mathematical model of the Silicon Chemical Vapor Deposition in an atmospheric Pressure cold-wall reactor

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dc.contributor.authorPark, Chong-Ookko
dc.contributor.authorChun, Soung Soonko
dc.contributor.authorPark, YJko
dc.contributor.authorMin, GJko
dc.contributor.authorPark, YWko
dc.date.accessioned2013-03-14T22:55:53Z-
dc.date.available2013-03-14T22:55:53Z-
dc.date.created2012-02-06-
dc.date.issued1989-06-
dc.identifier.citationEuro CVD 7th conference, C5-45-
dc.identifier.urihttp://hdl.handle.net/10203/114262-
dc.languageEnglish-
dc.publisherEuropean conference on CVD-
dc.titleA Mathematical model of the Silicon Chemical Vapor Deposition in an atmospheric Pressure cold-wall reactor-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationnameEuro CVD 7th conference, C5-45-
dc.identifier.conferencecountryFR-
dc.identifier.conferencelocationPerpignan-
dc.contributor.localauthorPark, Chong-Ook-
dc.contributor.localauthorChun, Soung Soon-
dc.contributor.nonIdAuthorPark, YJ-
dc.contributor.nonIdAuthorMin, GJ-
dc.contributor.nonIdAuthorPark, YW-
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MS-Conference Papers(학술회의논문)RIMS Conference Papers
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