DC Field | Value | Language |
---|---|---|
dc.contributor.author | Euisik Yoon | - |
dc.date.accessioned | 2013-03-14T22:15:47Z | - |
dc.date.available | 2013-03-14T22:15:47Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 1993 | - |
dc.identifier.citation | Extended Abstact of Electrochem. Soc. Meeting, v., no., pp.253 - 254 | - |
dc.identifier.uri | http://hdl.handle.net/10203/113913 | - |
dc.language | ENG | - |
dc.title | Suppression of Grain Growth and Surface Roughness of MOCVD Ta2O5 Films in a Stacked Gate Structure | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.beginningpage | 253 | - |
dc.citation.endingpage | 254 | - |
dc.citation.publicationname | Extended Abstact of Electrochem. Soc. Meeting | - |
dc.identifier.conferencecountry | United States | - |
dc.contributor.localauthor | Euisik Yoon | - |
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