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Growth mechanism of polycrystalline silicon using silane gases by LPCVD = 사일렌 가스를 사용하여 저압화학증착법으로 증착한 다결정 실리콘의 성장에 관한 연구link Wee, Hae-Sung; 위해성; Shin, Sung-Chul; Lee, Choo-Chon; et al, 한국과학기술원, 2000 |
Study on SiN and SiCN film production using PE-ALD process with high-density multi-ICP source at low temperature Song, Hohyun; Seo, Sang Hun; Chang, Hongyoung, CURRENT APPLIED PHYSICS, v.18, no.11, pp.1436 - 1440, 2018-11 |
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