Showing results 1 to 5 of 5
A Study on Photoresist using Concurrent Rqadical and Cationic Polymerization Park, Jong Jin; Kim, Jin-Baek, 한국고분자학회 1995년도 추계 학술대회 , pp.418 - 419, 한국고분자학회, 1995-10-06 |
Chemically Amplified Resists based on Poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate) Kim, Jin-Baek; Park, Jong Jin, 한국고분자학회 1999년도 춘계 학술대회 연구논문초록집, pp.135 - 135, 한국고분자학회, 1999 |
Photoresist using dioxaspiro ring-substituted acryl derivatives Kim, Jin-Baek; Park, Jong Jin; Jang, Ji Hyun |
Synthesis and lithographic characterization of 1,4-dioxaspiro[4.7]dodecane-2-methyl methacrylate Kim, Jin-Baek; Jang, Ji Hyun; Park, Jong Jin, 한국고분자학회 1998년도 추계 학술대회 , pp.284 - 285, 한국고분자학회, 1998-10 |
The effect of ionic conductivity and the performance of PDLC films Kim, Jin-Baek; Lee, Myung Gu; Park, Jong Jin; Lee, CS, Pacific Polymer Conference, pp.333 - 333, 1997 |
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