ECR plasma oxidation effects on performance and stability of polysilicon thin film transistors
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Lee Jung-Yeal | - |
| dc.contributor.author | Han Chul-Hi | - |
| dc.contributor.author | Kim, Choong Ki | - |
| dc.date.accessioned | 2013-03-14T06:04:40Z | - |
| dc.date.available | 2013-03-14T06:04:40Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1994-12-11 | - |
| dc.identifier.citation | Proceedings of the 1994 IEEE International Electron Devices Meeting, v., no., pp.523 - 526 | - |
| dc.identifier.issn | 0163-1918 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/105958 | - |
| dc.language | ENG | - |
| dc.title | ECR plasma oxidation effects on performance and stability of polysilicon thin film transistors | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-0028749058 | - |
| dc.type.rims | CONF | - |
| dc.citation.beginningpage | 523 | - |
| dc.citation.endingpage | 526 | - |
| dc.citation.publicationname | Proceedings of the 1994 IEEE International Electron Devices Meeting | - |
| dc.identifier.conferencecountry | United States | - |
| dc.identifier.conferencecountry | United States | - |
| dc.contributor.localauthor | Han Chul-Hi | - |
| dc.contributor.localauthor | Kim, Choong Ki | - |
| dc.contributor.nonIdAuthor | Lee Jung-Yeal | - |
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