Direct Micro/Nano Patterning of Multiple Colored Quantum Dots by Large Area and Multilayer Imprinting

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A novel direct method of micro/nano quantum dot (QD) patterning via one-step imprinting over a large area at low temperatures and low pressures was demonstrated as an alternative to conventional vacuum deposition and photolithography methods. More complex QD patterning could be demonstrated by expanding the QD direct imprinting process for multiple colored QD and patterning on the multiple layers. Additionally, a self-alignment scheme was developed to pattern multiple layers without the need for laborious alignment steps. Our approach may be useful for QD-based optoelectronic device fabrication and patterning on large flexible substrates due to the low-temperature requirements of this process.
Publisher
AMER CHEMICAL SOC
Issue Date
2012-05
Language
English
Article Type
Article
Keywords

NANOIMPRINT LITHOGRAPHY; FABRICATION; NM; NANOPARTICLES; ELECTRONICS; RESOLUTION; FEATURES

Citation

JOURNAL OF PHYSICAL CHEMISTRY C, v.116, no.21, pp.11728 - 11733

ISSN
1932-7447
DOI
10.1021/jp301397t
URI
http://hdl.handle.net/10203/103167
Appears in Collection
MS-Journal Papers(저널논문)ME-Journal Papers(저널논문)
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