Directional Photofluidization Lithography: Micro/Nanostructural Evolution by Photofluidic Motions of Azobenzene Materials

Cited 172 time in webofscience Cited 0 time in scopus
  • Hit : 432
  • Download : 108
This review demonstrates directional photofluidization lithography (DPL), which makes it possible to fabricate a generic and sophisticated micro/nanoarchitecture that would be difficult or impossible to attain with other methods. In particular, DPL differs from many of the existing micro/nanofabrication methods in that the post-treatment (i.e., photofluidization), after the preliminary fabrication process of the original micro/nanostructures, plays a pivotal role in the various micro/nanostructural evolutions including the deterministic reshaping of architectures, the reduction of structural roughness, and the dramatic enhancement of pattern resolution. Also, DPL techniques are directly compatible with a parallel and scalable micro/nanofabrication. Thus, DPL with such extraordinary advantages in micro/nanofabrication could provide compelling opportunities for basic micro/nanoscale science as well as for general technology applications.
Publisher
WILEY-V C H VERLAG GMBH
Issue Date
2012-04
Language
English
Article Type
Review
Keywords

SURFACE-RELIEF GRATINGS; SIDE-CHAIN POLYMER; SCANNING PROBE LITHOGRAPHY; SELF-ASSEMBLED MONOLAYERS; AZO-POLYMER; BLOCK-COPOLYMER; COLLOIDAL SPHERES; NEAR-FIELD; LARGE-AREA; PHOTOINDUCED ANISOTROPY

Citation

ADVANCED MATERIALS, v.24, no.16, pp.2069 - 2103

ISSN
0935-9648
DOI
10.1002/adma.201104826
URI
http://hdl.handle.net/10203/101377
Appears in Collection
CBE-Journal Papers(저널논문)
Files in This Item
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 172 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0