Browse bySubjectthermal annealing and gate oxide reliability

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Investigation of quasi-breakdown mechanism through post-quasi-breakdown thermal annealing

Loh, WY; Cho, Byung Jinresearcher; Li, MF, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.41, no.5A, pp.2873 - 2877, 2002-05

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