Browse by Subject lithography
Showing results 1 to 44 of 44
| 0.15 mu m T-shaped gate pseudomorphic HEMT fabricated using a new optical lithographic technique Park, BS; Lee, JH; Yoon, HS; Yang, JW; Park, Chul Soon; Pyun, KE, ELECTRONICS LETTERS, v.32, no.24, pp.2270 - 2271, 1996-11 |
| A chemically amplified positive-working photosensitive polyimide based on a blend of poly(amic acid ethoxymethyl ester) and poly(amic acid) Jung, Myung-Sup; Joo, Won-Jae; Choi, Byoung-Ki; Jung, HeeTae, POLYMER, v.47, no.19, pp.6652 - 6658, 2006-09 |
| A New Type of Eco-Friendly Resist Based on Nonchemically Amplified System Park, Ji Young; Yun, Je Moon; Kim, Jin-Baek, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.46, no.22, pp.7534 - 7542, 2008-11 |
| A one-step route to a perfectly ordered wafer-scale microbowl array for size-dependent superhydrophobicity Huang, Xing-Jiu; Lee, Joo-Hyung; Lee, Jong-Won; Yoon, Jun-Bo; Choi, Yang-Kyu, SMALL, v.4, no.2, pp.211 - 216, 2008-02 |
Bifunctional ITO layer with a high resolution, surface nano-pattern for alignment and switching of LCs in device applications Jeong, Hyeon-Su; Jeon, Hwan-Jin; Kim, Yun-Ho; Oh, Moon-Bee; Kumar, Pankaj; Kang, Shin-Woong; Jung, Hee-Tae, NPG ASIA MATERIALS, v.4, 2012-02 |
| Chiral Nematic Fluids as Masks for Lithography Jeong, Hyeon-Su; Kim, Yun-Ho; Lee, Ji-Sun; Kim, Jung-Hyun; Srinivasarao, Mohan; Jung, Hee-Tae, ADVANCED MATERIALS, v.24, no.3, pp.381 - +, 2012-01 |
| Colloidal Photonic Crystals toward Structural Color Palettes for Security Materials Lee, Hye-Soo; Shim, Tae-Soup; Hwang, Hye-Rim; Yang, Seung-Man; Kim, Shin-Hyun, CHEMISTRY OF MATERIALS, v.25, no.13, pp.2684 - 2690, 2013-07 |
| Controlled Pixelation of Inverse Opaline Structures Towards Refl ection- Mode Displays Lee, Su Yeon; Kim, Shin-Hyun; Hwang, Hyerim; Sim, Jae-Young; Yang, Seung-Man, ADVANCED MATERIALS, v.26, no.15, pp.2391 - 2397, 2014-04 |
| Deep-Nanoscale Pattern Engineering by Immersion-Induced Self-Assembly Park, Woon Ik; Kim, Jong Min; Jeong, Jae Won; Jung, Yeon Sik, ACS NANO, v.8, no.10, pp.10009 - 10018, 2014-10 |
| Development of 3-dimensional nanopatterning technology with ultra-high resolution and its applications for electrical/optical devices = 초고분해능을 갖는 3차원 나노패터닝 기술 개발과 나노패턴을 이용한 전기적/광학적 응용연구link Jeon, Hwan-Jin; 전환진; et al, 한국과학기술원, 2013 |
| Direct electron-beam writing with high aspect ratio for fabricating ion-beam lithography mask Lee, BN; Cho, Yong-Hoon; Kim, YS; Hong, W; Woo, HJ, JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, pp.S199 - S201, 2003-02 |
| Directed Self-Assembly with Sub-100 Degrees Celsius Processing Temperature, Sub-10 Nanometer Resolution, and Sub-1 Minute Assembly Time Park, Woon-Ik; Kim, Kyung-Ho; Jang, Hyun-Ik; Jeong, Jae-Won; Kim, Jong-Min; Choi, Jae-Suk; Park, Jae-Hong; et al, SMALL, v.8, no.24, pp.3762 - 3768, 2012-12 |
| Fabrication of 10 nm-Scale Complex 3D Nanopatterns with Multiple Shapes and Components by Secondary Sputtering Phenomenon Jeon, Hwan-Jin; Jeong, Hyeon Su; Kim, Yun Ho; Jung, Woo-Bin; Kim, Jeong Yeon; Jung, HeeTae, ACS NANO, v.8, no.2, pp.1204 - 1212, 2014-02 |
| Fabrication of nanodevice using individual single crystalline nanowire and their physical property measurements = 단결정 단일 나노선을 이용한 나노소자 제작과 특성에 관한 연구link Lee, Sung-hun; 이성훈; et al, 한국과학기술원, 2008 |
| Fabrication of one-dimensional and two-dimensional periodically polarity inverted ZnO structures using the patterned CrN buffer layers Park, JS; Minegishi, T; Lee, SH; Im, IH; Park, SH; Goto, T; Cho, MW; et al, JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, v.27, pp.1658 - 1661, 2009-05 |
| Fabrication of pyrolyzed carbon nanowire array and its application to field emission = 열분해 탄소 나노선 어레이의 제작 및 전계방출에의 응용link Lee, Seok-Woo; 이석우; et al, 한국과학기술원, 2008 |
| Fabrication of versatile metal oxide nanostructures using hybrid organic-inorganic materials and their applications = 유무기 하이브리드 물질을 이용한 다양한 메탈 옥사이드 나노구조체 제작과 그 응용link Shin, Seungmin; 신승민; et al, 한국과학기술원, 2017 |
| Gold-conjugated protein nanoarrays through block-copolymer lithography: From fabrication to biosensor design Jung, Jin-Mi; Kwon, Ki Young; Ha, Tai-Hwan; Chung, Bong Hyun; Jung, HeeTae, SMALL, v.2, no.8-9, pp.1010 - 1015, 2006-08 |
| High performance molecular resists based on beta-cyclodextrin Kwon, Younggil; Yun, Hyojin; Ganesan, Ramakrishnan; Kim, Jin-Baek; Choi, Jae-Hak, POLYMER JOURNAL, v.38, no.9, pp.996 - 998, 2006 |
| High-Resolution p-Type Metal Oxide Semiconductor Nanowire Array as an Ultrasensitive Sensor for Volatile Organic Compounds Cho, Soo-Yeon; Yoo, Hae-Wook; Kim, Ju Ye; Jung, Woo Bin; Jin, Ming Liang; Kim, Jong-Seon; Jeon, Hwan-Jin; et al, NANO LETTERS, v.16, no.7, pp.4508 - 4515, 2016-07 |
| Highly Enhanced Fluorescence Signals of Quantum Dot-Polymer Composite Arrays Formed by Hybridization of Ultrathin Plasmonic Au Nanowalls Cho, Soo-Yeon; Jeon, Hwan-Jin; Yoo, Hae Wook; Cho, Kyeong Min; Jeong, Woo Bin; Kim, Jong-Seon; Jung, Hee-Tae, NANO LETTERS, v.15, no.11, pp.7273 - 7280, 2015-11 |
| Holographic Fabrication of Microstructures with Internal Nanopatterns Using Microprism Arrays Lee, Seung-Kon; Park, Hyo Sung; Yi, Gi-Ra; Moon, Jun Hyuk; Yang, Seung-Man, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.48, no.38, pp.7000 - 7005, 2009-09 |
| Magnetoresponsive Discoidal Photonic Crystals Toward Active Color Pigments Lee, Hye Soo; Kim, Ju Hyeon; Lee, Joon-Seok; Sim, Jae Young; Seo, Jung Yoon; Oh, You-Kwan; Yang, Seung-Man; et al, ADVANCED MATERIALS, v.26, no.33, pp.5801 - 5807, 2014-09 |
| Mass Spectrometry Assisted Lithography for the Patterning of Cell Adhesion Ligands on Self-Assembled Monolayers Kim, Young-Kwan; Ryoo, Soo-Ryoon; Kwack, Sul-Jin; Min, Dal-Hee, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.48, no.19, pp.3507 - 3511, 2009 |
| Micro/nano-heater integrated cantilevers for micro/nano-lithography applications Lee, Dong-Weon; Oh, Il-Kwon, MICROELECTRONIC ENGINEERING, v.84, no.5-8, pp.1041 - 1044, 2007-05 |
| Molecular and polymeric resists for deep UV lithography = Deep UV 리소그라피용 분자 및 고분자 레지스트에 관한 연구link Ganesan, Ramakrishnan; 가네산, 라마크리시난; et al, 한국과학기술원, 2006 |
| Nanomachining by colloidal lithography Yang, Seung-Man; Jang, SG; Choi, DG; Kim, S; Yu, HK, SMALL, v.2, no.4, pp.458 - 475, 2006-04 |
| Nanosinusoidal Surface Zinc Oxide for Optical Out-coupling of Inverted Organic Light-Emitting Diodes Kim, Do-Hong; Woo, Kie Young; Han, Jun Hee; Lee, TaeWoo; Lee, Hoseung; Cho, Yong-Hoon; Choi, Kyung Cheol, ACS PHOTONICS, v.5, no.10, pp.4061 - 4067, 2018-10 |
| Negative-Tone Block Copolymer Lithography by In Situ Surface Chemical Modification Kim, Bong-Hoon; Byeon, Kyeong-Jae; Kim, Juyoung; Kim, Jinseung; Jin, Hyeong Min; Cho, Joong-Yeon; Jeong, Seong-Jun; et al, SMALL, v.10, no.20, pp.4207 - 4212, 2014 |
| New Top-Down Approach for Fabricating High-Aspect-Ratio Complex Nanostructures with 10 nm Scale Features Jeon, Hwan-Jin; Kim, Kyoung-Hwan; Baek, Youn-Kyoung; Kim, Dae-Woo; Jung, Hee-Tae, NANO LETTERS, v.10, no.9, pp.3604 - 3610, 2010 |
| Non-shrinkable and nanomolecular resists for DUV lithography = 비수축성 레지스트와 나노분자 레지스트에 관한 연구link Oh, Tae-Hwan; 오태환; et al, 한국과학기술원, 2006 |
| Novel photobleachable deep UV resists based on single component nonchemically amplified resist system Kim, Jin-Baek; Kim, KS, MACROMOLECULAR RAPID COMMUNICATIONS, v.26, no.17, pp.1412 - 1417, 2005-09 |
| Novel top-surface imaging process by selective chemisorption of poly(dimethyl siloxane) on diazoketo-functionalized single component photoresist Ganesana, Ramakrishnan; Youna, Seul-Ki; Kim, Jin-Baek, MACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.5, pp.437 - 441, 2008-03 |
| One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy Jeong, Seong-Jun; Moon, Hyoung-Seok; Shin, Jong-Hwa; Kim, Bong-Hoon; Shin, Dong-Ok; Kim, Ju-Young; Lee, Yong-Hee; et al, NANO LETTERS, v.10, no.9, pp.3500 - 3505, 2010-09 |
| One-Step Modification of Superhydrophobic Surfaces by a Mussel-Inspired Polymer Coating Kang, SM; You, I; Cho, WK; Shon, HK; Lee, TG; Choi, Insung; Karp, JM; et al, ANGEWANDTE CHEMIE-INTERNATIONAL EDITION, v.49, no.49, pp.9401 - 9404, 2010 |
| Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography Baruth, Andrew; Seo, Myungeun; Lin, Chun Hao; Walster, Kern; Shankar, Arjun; Hillmyer, Marc A.; Leighton, C, ACS APPLIED MATERIALS & INTERFACES, v.6, no.16, pp.13770 - 13781, 2014-08 |
| Polymeric and molecular resists for short wavelength lithography = 단파장 리소그라피용 고분자 및 분자 레지스트link Yun, Hyo-Jin; 윤효진; et al, 한국과학기술원, 2002 |
| Preparation of a chemically amplified photosensitive polyimide based on norbornene-end-capped poly(amic acid ethoxymethylester) Jung, MS; Lee, SK; Hyeon-Lee, J; Park, MK; Jung, HeeTae, JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, v.43, no.22, pp.5520 - 5528, 2005-11 |
| Selective positioning of thermo curable materials using photolithography = 리소그래피를 이용한 열경화성 물질의 선택적 도포에 관한 연구link Cho, Young-Ook; 조영욱; et al, 한국과학기술원, 2013 |
| Synthesis and characterization of photopatternable epoxy hybrid materials for the fabrication of thick and thermally stable microstructures with a high aspect ratio Jung, Kyung Ho; Bae, Byeong-Soo, JOURNAL OF APPLIED POLYMER SCIENCE, v.108, no.5, pp.3169 - 3176, 2008-06 |
| Synthesis of copolymers with diazo groups and their application as DUV resists = 다이아조기를 포함하는 고분자의 합성과 레지스트로서의 응용link Kim, Kyoung-Seon; 김경선; et al, 한국과학기술원, 2005 |
| Synthesis of norbornene copolymers with β-keto ester groups and their application as photoresists = 베타-케토 에스테르기를 노르보넨 측쇄에 함유하는 공중합체의 합성과 포토레지스트로서의 응용link Kim, Kyoung-Seon; 김경선; et al, 한국과학기술원, 2001 |
| Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning Jeong, Seong-Jun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Ju-Young; Yu, Jae-Ho; Lee, Su-Mi; Lee, Moon-Gyu; et al, ACS NANO, v.4, no.9, pp.5181 - 5186, 2010-09 |
| 블록공중합체 나노리소그래피를 이용한 다양한 전자소자 응용에 관한 연구 = Block copolymer nanolithography for various electronic deviceslink 진형민; Jin, Hyeong Min; et al, 한국과학기술원, 2013 |
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- 30,880 2020 - 2024
- 99,973 2010 - 2019
- 75,674 2000 - 2009
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