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0.15 mu m T-shaped gate pseudomorphic HEMT fabricated using a new optical lithographic technique Park, BS; Lee, JH; Yoon, HS; Yang, JW; Park, Chul Soon; Pyun, KE, ELECTRONICS LETTERS, v.32, no.24, pp.2270 - 2271, 1996-11 |
Ka-band VCO with parasitic capacitance cancelling technique Lee, Wonho; Lee, S.; Choi, J.; So, J.; Kwon, Y., ELECTRONICS LETTERS, v.53, no.1, pp.38 - 39, 2017-01 |
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