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Showing results 1 to 3 of 3

1
Commensurability-Driven Orientation Control during Block Copolymer Directed Self-Assembly

Yun, Hyun Su; Do, Hyung Wan; Berggren, Karl K.; Ross, Caroline A.; Choi, Hong Kyoon, ACS APPLIED MATERIALS & INTERFACES, v.12, no.9, pp.10852 - 10857, 2020-03

2
Directed self-assembly of block copolymers combining top-down and bottom-up approaches

Kim, Bong-Hoon; Jeong, Seong-Jun; Shin, Dong-Ok; Park, Seung-Hak; Lee, Hyung-Min; Xia, Guodong; Koo, Chong-Min; et al, ELECTRONIC MATERIALS LETTERS, v.3, no.3, pp.147 - 153, 2007-09

3
Ultralarge-Area Block Copolymer Lithography Enabled by Disposable Photoresist Prepatterning

Jeong, Seong-Jun; Moon, Hyoung-Seok; Kim, Bong-Hoon; Kim, Ju-Young; Yu, Jae-Ho; Lee, Su-Mi; Lee, Moon-Gyu; et al, ACS NANO, v.4, no.9, pp.5181 - 5186, 2010-09

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