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Inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD) 법으로 증착한 비정질 질화규소 박막의 특성 = Characterization of amorphous silicon nitride thin film deposited by inductively coupled plasma enhanced chemical vapor deposition (ICP-CVD)link 한상수; Han, Sang-Soo; et al, 한국과학기술원, 1997 |
Role of Electronic States and Their Coupling on Radiative Losses of Open-Circuit Voltage in Organic Photovoltaics Jain, Nakul; Sharma, Ramakant; Mahesh, Suhas; Moghe, Dhanashree; Snaith, Henry J.; Yoo, Seunghyup; Kabra, Dinesh, ACS APPLIED MATERIALS & INTERFACES, v.13, no.50, pp.60279 - 60287, 2021-12 |
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