Showing results 1 to 4 of 4
Amidoxime-Containing Ti Precursors for Atomic Layer Deposition of TiN Thin Films with Suppressed Columnar Microstructure Lee, Ga Yeon; Yeo, Seungmin; Cho, Chan-Mi; Oh, Seung Hoon; Park, Hyeonbin; Park, Bo Keun; Son, Seung Uk; et al, INORGANIC CHEMISTRY, v.62, no.11, pp.4680 - 4687, 2023-03 |
Atomic Layer Deposition 방법을 이용한 금속 게이트 전극 일함수 조정에 대한 연구 = Study on tuning effective work function of metal gate electrode using atomic layer depositionlink 임성묵; Lim, Sung-Mook; et al, 한국과학기술원, 2013 |
Surface morphology improvement of metalorganic chemical vapor deposition Al films by layered deposition of Al and ultrathin TiN Ahn, Seong-Deok; Lee, Hyun-Bae; Kang, Sang-Won, JAPANESE JOURNAL OF APPLIED PHYSICS, v.39, no.6A, pp.3349 - 3354, 2000-06 |
원자층 단위 증착법으로 증착된 TiN 증착기구에 대한 모델 연구 = A study of the deposition model about ALD (atomic layer deposition) TiN methodlink 박진성; Park, Jin-Seong; et al, 한국과학기술원, 1999 |
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