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Showing results 1 to 13 of 13

1	A Brownian dynamics simulation method for analyzing particle behavior in nonuniform and alternating electric fields Choi, Jin Young; Park, Seok Joo; Kim, Sang Soo, JOURNAL OF AEROSOL SCIENCE, v.38, no.2, pp.192 - 210, 2007-02
2	A new type groove for hydraulic spool valve Hong, Sung Ho; Kim, Kyung-Woong, TRIBOLOGY INTERNATIONAL, v.103, pp.629 - 640, 2016-11
3	A STUDY OF DENSITY IN ELECTRON-CYCLOTRON-RESONANCE PLASMA UHM, HS; LEE, PH; KIM, YI; KIM, JH; Chang, Hong-Young, IEEE TRANSACTIONS ON PLASMA SCIENCE, v.23, no.4, pp.628 - 635, 1995-08
4	Characteristics of cylindrical plasma discharge with a thermal electron beam Bae, Inshik; Na, Byungkeun; Chang, Hongyoung, PHYSICS OF PLASMAS, v.23, no.9, pp.093513, 2016-09
5	Effect of substrate temperature on the texture and structure of polycrystalline Si0.7Ge0.3 films deposited on SiO2 by molecular beam deposition Kim, HS; Lee, JeongYong, THIN SOLID FILMS, v.350, no.1-2, pp.14 - 20, 1999-08
6	Effects of thermal and chemical surface-flame interaction on flame quenching Kim, Kyu Tae; Lee, Dae Hoon; Kwon, Sejin, COMBUSTION AND FLAME, v.146, no.1-2, pp.19 - 28, 2006-07
7	ELECTRON AND ION ENERGIES IN PLASMAS GENERATED BY THE ELECTRON-CYCLOTRON-RESONANCE MECHANISM UHM, HS; Chang, Hong-Young; KIM, JH; SONG, SK, PHYSICS OF PLASMAS, v.2, no.3, pp.991 - 1001, 1995-03
8	High-quality epitaxial growth of in situ phosphorus-doped Si films by promoting dispersion of native oxides in alpha-Si Kim, HS; Shim, KH; Lee, SY; Lee, JeongYong; Kang, JY, JOURNAL OF CRYSTAL GROWTH, v.212, no.3-4, pp.423 - 428, 2000-05
9	Improvement of the subcooled boiling model using a new net vapor generation correlation inferred from artificial neural networks to predict the void fraction profiles in the vertical channel Lee, Taebeom; Jeong, Yong Hoon, NUCLEAR ENGINEERING AND TECHNOLOGY, v.54, no.12, pp.4776 - 4797, 2022-12
10	Improvements in predicting void fraction in subcooled boiling Ha, KS; Lee, YB; No, Hee Cheon, NUCLEAR TECHNOLOGY, v.150, no.3, pp.283 - 292, 2005-06
11	NEW METHOD TO IMPROVE THERMAL-STABILITY IN THE INTERFACE OF SILICON AND TUNGSTEN BY THE INTERPOSITION OF PLASMA-DEPOSITED TUNGSTEN NITRIDE THIN-FILM LEE, CW; KIM, YT; Lee, JeongYong, APPLIED PHYSICS LETTERS, v.64, no.5, pp.619 - 621, 1994-01
12	Strong variation of average ion energy in oscillation frequency of sheath potential Lee, Young D.; Kim, SS; Ku, SH; Chang, Choong-Seock, Physics of Plasmas, v.7, no.2, pp.766 - 769, 2000-02
13	THERMODYNAMIC AND EXPERIMENTAL-STUDY OF DIAMOND DEPOSITION FROM A CH4-H2 GAS-MIXTURE KIM, JW; BAIK, YJ; EUN, KY; Yoon, Duk Yong, THIN SOLID FILMS, v.212, no.1-2, pp.104 - 111, 1992-05

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