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Improvement of a block co-polymer (PS-b-PMMA)-masked silicon etch profile using a neutral beam Yun, Deokhyun; Park, Jinwoo; Kim, Hwasung; Mun, Jeong Ho; Kim, Sang Ouk; Kim, Kyongnam; Yeom, Geunyoung, NANOTECHNOLOGY, v.27, no.38, 2016-09 |
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