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Showing results 1 to 5 of 5

1
Chemically amplified resists based on poly(1,4-dioxaspiro[4.4]nonane-2-methyl methacrylate)

Kim, Jin-Baek; Park, JJ; Jang, JH, POLYMER, v.41, no.1, pp.149 - 153, 2000-01

2
Design and construction of an Offner spectrometer based on geometrical analysis of ring fields

Kim, Seo Hyun; Kong, Hong-Jin; Lee, Jong Ung; Lee, Jun Ho; Lee, Jai Hoon, REVIEW OF SCIENTIFIC INSTRUMENTS, v.85, no.8, pp.083108 - 083108-7, 2014-08

3
High performance molecular resists based on beta-cyclodextrin

Kwon, Younggil; Yun, Hyojin; Ganesan, Ramakrishnan; Kim, Jin-Baek; Choi, Jae-Hak, POLYMER JOURNAL, v.38, no.9, pp.996 - 998, 2006

4
Photobleachable silicon-containing molecular resist for deep UV lithography

Kim, Jin-Baek; Ganesan, Ramakrishnan; Choi, Jae-Hak; Yun, Hyo-Jin; Kwon, Young-Gil; Kim, Kyoung-Seon; Oh, Tae-Hwan, JOURNAL OF MATERIALS CHEMISTRY, v.16, no.34, pp.3448 - 3451, 2006

5
Room temperature processable silicon-containing molecular resist

Park, Ji Young; Kim, Myung Gi; Kim, Jin-Baek, MACROMOLECULAR RAPID COMMUNICATIONS, v.29, no.18, pp.1532 - 1537, 2008-09

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