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Channel Strain Measurement of Si1-xCx Structures: Effects of Gate Length, Source/Drain Length, and Source/Drain Elevation Kim, Sun-Wook; Byun, Dae-Seop; Jung, Mijin; Chopra, Saurabh; Kim, Yihwan; Kim, Jae-Hyun; Han, Seung Min J.; et al, APPLIED PHYSICS EXPRESS, v.6, no.6, 2013-06 |
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