Effect of atomic layer deposition on the quality factor of silicon nanobeam cavities

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In this work we study the effect of thin-film deposition on the quality factor (Q) of silicon nanobeam cavities. We observe an average increase in the Q of 38 +/- 31% in one sample and investigate the dependence of this increase on the initial nanobeam hole sizes. We note that this process can be used to modify cavities that have larger than optimal hole sizes following fabrication. Additionally, the technique allows the tuning of the cavity mode wavelength and the incorporation of new materials, without significantly degrading Q. (C) 2012 Optical Society of America
Publisher
OPTICAL SOC AMER
Issue Date
2012-02
Language
English
Article Type
Article
Keywords

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Citation

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, v.29, no.2, pp.55 - 59

ISSN
0740-3224
URI
http://hdl.handle.net/10203/97401
Appears in Collection
PH-Journal Papers(저널논문)
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