An ellipsometric data acquisition method for thin film thickness measurement in real time

Abstract

A novel ellipsometric data acquisition method is introduced to measure the optical properties of a sample in real time. The experimental setup utilized a focused-beam ellipsometer integrated high numerical aperture objective lens in the normal direction to the sample surface. It is able to achieve ellipsometic data at multiple angles of incidence within a sub-mu m region of sample. Also a calibration technique is described. The experimental results for various SiO(2.) thin film samples are demonstrated.