Atomic structure of B-P and self-interstitial-B-P complexes in Si

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dc.contributor.authorMoon, CYko
dc.contributor.authorIkini, YSko
dc.contributor.authorChang, Kee-Jooko
dc.date.accessioned2013-03-04T21:45:07Z-
dc.date.available2013-03-04T21:45:07Z-
dc.date.created2012-02-06-
dc.date.created2012-02-06-
dc.date.issued2003-02-
dc.identifier.citationJOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.42, pp.S602 - S605-
dc.identifier.issn0374-4884-
dc.identifier.urihttp://hdl.handle.net/10203/84262-
dc.description.abstractWe investigate the atomic structure of B-P pairs in bulk Si through first-principles pseudopotential calculations, and find that a B-P pair is energetically most stable when P is positioned at a substitutional site in the second nearest neighborhood of B. We also examine the energetics of various I-s-B-P complexes that consist of B. P, and Si self-interstitial (I-s). In this complex, P also prefers a substitutional site in the second nearest neighborhood of B: however. its actual position depends oil the charge state of the complex. We find that the formation of the I-s-B-P complex is energetically more favorable than for the I-s-B complex, which is a major diffusing species in B-doped material.-
dc.languageEnglish-
dc.publisherKOREAN PHYSICAL SOC-
dc.subjectTRANSIENT ENHANCED DIFFUSION-
dc.subjectFIRST-PRINCIPLES-
dc.subjectBORON-DIFFUSION-
dc.subjectSILICON-
dc.subjectPHOSPHORUS-
dc.subjectIMPLANTATION-
dc.subjectPSEUDOPOTENTIALS-
dc.subjectTECHNOLOGY-
dc.subjectDEFECTS-
dc.titleAtomic structure of B-P and self-interstitial-B-P complexes in Si-
dc.typeArticle-
dc.identifier.wosid000181337500113-
dc.identifier.scopusid2-s2.0-0037305639-
dc.type.rimsART-
dc.citation.volume42-
dc.citation.beginningpageS602-
dc.citation.endingpageS605-
dc.citation.publicationnameJOURNAL OF THE KOREAN PHYSICAL SOCIETY-
dc.contributor.localauthorChang, Kee-Joo-
dc.contributor.nonIdAuthorMoon, CY-
dc.contributor.nonIdAuthorIkini, YS-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle; Proceedings Paper-
dc.subject.keywordAuthorB-P pairs-
dc.subject.keywordAuthorself-interstitial Si-
dc.subject.keywordAuthorI-B-P complex-
dc.subject.keywordPlusTRANSIENT ENHANCED DIFFUSION-
dc.subject.keywordPlusFIRST-PRINCIPLES-
dc.subject.keywordPlusBORON-DIFFUSION-
dc.subject.keywordPlusSILICON-
dc.subject.keywordPlusPHOSPHORUS-
dc.subject.keywordPlusIMPLANTATION-
dc.subject.keywordPlusPSEUDOPOTENTIALS-
dc.subject.keywordPlusTECHNOLOGY-
dc.subject.keywordPlusDEFECTS-
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