Single-layer halftone phase-shifting masks for DUV microlithography: Optical property simulation and chromium compound film preparation
The investigation of single layer halftone. phase shift mask (SLHTPSM) has been carried by both simulation and chromium fluoride film fabrication. Theoretical analysis provides the optimum SLHTPSM constructions for I-line (365 nm), KrF (248 nm) and Aff (193 nm) microlithographies. A fully characterization of chromium fluoride film processed by de magnetron sputtering shows a feasibility of using this film in the fabricating DUV-PSM.
- Publisher
- ELSEVIER SCIENCE BV
- Issue Date
- 1997-04
- Language
- English
- Article Type
- Article; Proceedings Paper
- Citation
APPLIED SURFACE SCIENCE, v.113, pp.680 - 684
- ISSN
- 0169-4332
- Appears in Collection
- MS-Journal Papers(저널논문)
- Files in This Item
- There are no files associated with this item.
This item is cited by other documents in WoS
| ⊙ Detail Information in WoSⓡ | Click to see |  |
| ⊙ Cited 3 items in WoS | Click to see citing articles in |  |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.