Electrical properties of PZT thin films deposited on LSCO electrodes

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La0.5Sr0.5CoO3 (LSCO) thin films were deposited on Pt/Ti/SiO2/Si substrates by DC reactive sputtering at 450 degrees C and were annealed at temperatures ranging from 550 degrees C to 750 degrees C for 30 min in an O-2 ambient to improve the crystallinity of the LSCO film and to reduce its resisitivity. Pb(Zr0.48Ti0.52)O-3 (PZT) thin films were then deposited on the LSCO electrodes by using DC reactive sputtering at a substrate temperature of 550 OC. X-ray diffraction patterns indicate that the PZT films grown on the LSCO/Pt electrodes showed a (001) preferred orientation and had a uniform matrix of densely packed round grains. The PZT thin films showed a remanent polarization (2P(r)) of about 46 similar to 52 mu C/cm(2) and a coercive voltage of about 1 V. The leakage current density remained on the order of 10(-7)similar to 10(-8) A/cm(2) at applied voltage below 5 V. When LSCO was used as bottom electrode, an improvement in fatigue properties was obtained. After 10(10) cycles of switching at an applied voltage of 5 V, the thin film did not show any significant change in the polarization.
Publisher
KOREAN PHYSICAL SOC
Issue Date
1999-07
Language
English
Article Type
Article; Proceedings Paper
Keywords

O HETEROSTRUCTURES

Citation

JOURNAL OF THE KOREAN PHYSICAL SOCIETY, v.35, pp.500 - 2

ISSN
0374-4884
URI
http://hdl.handle.net/10203/74355
Appears in Collection
MS-Journal Papers(저널논문)
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