Fermi-level pinning of Ag on Si(111)-(7x7)

Cited 5 time in webofscience Cited 5 time in scopus
  • Hit : 393
  • Download : 0
The electronic structure of the Ag overlayer reconstructed on Si(111) has been studied by using ultraviolet photoemission spectroscopy with synchrotron radiation. Strong Fermi-level pinning observed in Si(111)-(root 3 X root 3)R30 degrees-Ag reconstructed phases is decreased in the (3 X 1) phase, where the pinning level is quite comparable to that of thick layers. The position and width of the Ag 4d band are invariant under this phase change. These results raise strong questions on the origin of Fermi-level pinning at this surface. The possible origin of this Fermi-level pinning will be discussed.
Publisher
AMERICAN PHYSICAL SOC
Issue Date
1995
Language
English
Article Type
Article
Keywords

(ROOT(3)X-ROOT(3)R30-DEGREES AG/SI(111) SURFACE; SCANNING-TUNNELING-MICROSCOPY; 1ST-PRINCIPLES CALCULATIONS; SCHOTTKY-BARRIER; SEMICONDUCTOR INTERFACES; ELECTRONIC-PROPERTIES; SPECTROSCOPY; ANGLE; LAYER

Citation

PHYSICAL REVIEW B, v.52, no.23, pp.16325 - 16328

ISSN
0163-1829
DOI
10.1103/PhysRevB.52.16325
URI
http://hdl.handle.net/10203/72398
Appears in Collection
Files in This Item
There are no files associated with this item.
This item is cited by other documents in WoS
⊙ Detail Information in WoSⓡ Click to see webofscience_button
⊙ Cited 5 items in WoS Click to see citing articles in records_button

qr_code

  • mendeley

    citeulike


rss_1.0 rss_2.0 atom_1.0